Preparation of atomically flat SrTiO3 surfaces using a deionized-water leaching and thermal annealing procedure

Conducting LaAlO3/SrTiO3 heterointerfaces on atomically-flat substrates prepared by deionized-water

We have investigated how the recently-developed water-leaching method for atomically-flat SrTiO3 (STO) substrates affects the transport properties of LaAlO3 (LAO) and STO heterointerfaces. Using pulsed laser deposition at identical growth conditions, we have synthesized epitaxial LAO thin-films on two different STO substrates, which are prepared by water-leaching and buffered hydrofluoric acid ...

Atomically Flat Zigzag Edges in Monolayer MoS2 by Thermal Annealing.

The edges of 2D materials show novel electronic, magnetic, and optical properties, especially when reduced to nanoribbon widths. Therefore, methods to create atomically flat edges in 2D materials are essential for future exploitation. Atomically flat edges in 2D materials are found after brittle fracture or when electrically biasing, but a simple scalable approach for creating atomically flat p...

Preparation of atomically flat surfaces on silicon carbide using hydrogen etching

Hydrogen etching of 6Hand 4H-SiC(0001) surfaces is studied. The aspolished substrates contain a large number of scratches arising from the polishing process which are eliminated by hydrogen etching. Etching is carried out in a flow of hydrogen gas at atmospheric pressure and temperatures around 1600-1700 C attained on a tantalum strip heater. Post-etching atomic force microscopy (AFM) images sh...

Surface properties of atomically flat poly-crystalline SrTiO3

Comparison between single- and the poly-crystalline structures provides essential information on the role of long-range translational symmetry and grain boundaries. In particular, by comparing single- and poly-crystalline transition metal oxides (TMOs), one can study intriguing physical phenomena such as electronic and ionic conduction at the grain boundaries, phonon propagation, and various do...

Preparation/Characterization of Atomically Flat and Clean Mo (100) Surfaces and Thermal Emittance/Response Time Measurements of Cs3Sb Photocathodes